Intel Foundry has reported processing more than one million wafers using High Numerical Aperture Extreme Ultraviolet (High NA EUV) lithography technology, according to a recent update. The company stated that this milestone includes wafers processed during tool certification, testing, research and development, and volume production.
The technology is currently being used on select layers of some Intel Core Ultra Series 3 processors, code-named Panther Lake. Intel noted that performance metrics for products manufactured using the Intel 18A process with High NA on selected layers meets or exceeds comparable layers produced using ASML’s existing NXE EUV platform.
Regarding manufacturing infrastructure, Intel said customers can use High NA today with existing 6-inch masks. The company is also working to transition toward larger 6x12-inch masks, a process that has taken more than three years. Intel is collaborating with ASML, mask manufacturers, automation suppliers, and EDA partners to develop the necessary standards for this transition.
Intel Executive Vice President and Intel Foundry Co-General Manager Naga Chandrasekaran emphasized that future AI products require manufacturing technologies that are ready for production and easy for customers to adopt.
On the financial side, Intel recently executed an expanded capital raise of $20 billion. Tech investor Dan Niles suggested this move strengthens the view that the company could be approaching major foundry customer wins that require additional capacity. KKM Financial founder Jeff Kilburg described the offering as strategic, noting it supports AI demand without adding pressure to the balance sheet or credit rating.
Regarding stock performance, Intel shares rose more than 3% in premarket trading on Tuesday. The stock was trading at $98.95 at the time of the report. The company carries a consensus Hold rating and an average price forecast of $110.85, according to data cited in the article.
